top of page
Vacuum Brazing furnace.png

CVD

Microwave Plasma Chemical Vapour Deposition

IMG-20230306-WA0004 - Copy_edited_edited.jpg

Microwave Plasma Chemical Vapor Deposition (CVD) is a specialized technique used in materials science and nanotechnology for the synthesis and deposition of thin films onto substrates. This method utilizes microwave-induced plasma to generate highly reactive species that facilitate the growth of thin films with precise control over properties such as thickness, composition, and crystallinity.

research-and-development.png
R&D Systems with CVD
bottom of page