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Chemical Vapour Deposition Systems

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Chemical Vapor Deposition (CVD) is a process used to produce high-quality, high-performance solid materials. It involves the deposition of a thin film of material onto a substrate surface through the chemical reaction of gaseous precursor compounds. A Chemical Vapor Deposition system is the apparatus used to carry out this process.

CVD systems are widely used in various industries and research fields for the deposition of thin films with precise thickness, composition, and properties. Applications include semiconductor manufacturing, thin-film solar cells, coatings for cutting tools and medical devices, and research in materials science and nanotechnology.

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