Geometry   

                                  
Maximum temperature   

            
Power requirement   

            
Material   

                                 
Diameter               

     
Maximum temperature     

           
Power requirement   

            
Sensor                       

 
Operation         

         
Pump type   

                
Power requirement   

            
Ultimate pressure     

           
Chamber isolation 

              
Vacuum sensor       

            
Channels               

    
Controller               

     
Maximum flow                    

Chemical deposition systems, which encompass various techniques like Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), and others, incorporate several key features to facilitate the deposition of thin films with specific properties. Here are some of the essential features commonly found in these systems:

Gas Delivery System
Temperature Control
Vacuum System 
Substrate Handling System 
Precursor Gas Purification System 
Film Thickness Monitoring and Control 
Safety Features 
Process Control and Automation 
Data Logging and Analysis 
User Interface 

These features collectively enable the precise and controlled deposition of thin films for a wide range of applications in industries such as semiconductor manufacturing, optoelectronics, photovoltaics, coatings, and surface engineering.