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Microwave Plasma Chemical Vapour Deposition


Microwave Plasma Chemical Vapor Deposition (CVD) is a specialized technique used in materials science and nanotechnology for the synthesis and deposition of thin films onto substrates. This method utilizes microwave-induced plasma to generate highly reactive species that facilitate the growth of thin films with precise control over properties such as thickness, composition, and crystallinity.

R&D Systems with CVD
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