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Reactive Ion Etching


Reactive Ion Etching (RIE) uses physical and chemical processes to etch away materials from surfaces of samples. In RIE, a gas glow discharge is created between two electrodes that creates ions of inert and reactive gases that remove materials from the substrate surface. This process is popularly used for machining and etching materials for high performance nano and micro scale device fabrication.

R&D Systems with Thermal Evaporation
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